There is a need for a new generation of light management systems to suit the needs of emerging optoelectronic devices where the development of new large area and low cost fabrication routes can considerably reduce the manufacturing costs and increase the production throughput.
Soft nanoimprint lithography is a promising approach for satisfaying all these requests. This unconventional nanofabrication technique enables the creation of photonic and plasmonic architectures based on unconventional materials such as colloids, polymers, cellulose and many others. We combine the intrinsic properties of the materials with the complex optical response given by the nanostructuration.